High-purity amino metal compounds are essential for advanced materials in various fields!

Amino metal compounds are primarily used as precursors for high-k materials, with a purity level of up to 5N. Leveraging advanced deposition techniques such as ALD and CVD, we are able to produce nitrogen compounds, oxides, or elemental metals with high dielectric constants. These materials find extensive applications in dynamic memory, photovoltaic cells, CMOS technology, capacitors, transistors, ferroelectric memory, and high-definition display technologies.

Let's take a closer look at two amino metal compounds:

Pentakis(dimethylamino)tantalum (CAS: 19824-59-0):

This compound serves as a precursor for TaN and offers excellent conductivity. It can be used in the electrode manufacturing of semiconductor devices, diffusion barrier layers in post-processing, metallization of photovoltaic cell cathodes, and as a precursor for metal gate materials in CMOS processes below 45nm. It is also a key material for dynamic random-access memory (DRAM), anti-reflective coatings, high-temperature impedance, gas sensors, capacitors, high-refractive-index low-dispersion special optical glasses, and high-temperature special ceramics for aerospace applications. Additionally, it enables the selective catalysis of chiral drugs and provides extra oxygen sources for enzyme-catalyzed reactions, enhancing efficiency and stability.

Tetrakis(dimethylamino)titanium (CAS: 3275-24-9):

TDMAT is a hot topic in the ALD and CVD fields. It serves as a precursor for TiO2, a crucial high-k and metal gate material for technologies below 32nm. TiO2 can be used as an electron transport layer for n-type semiconductors. When doped with other compounds, it exhibits ultra-high dielectric constants and low dielectric loss, making it ideal for capacitor and small device manufacturing in random dynamic memory. TDMAT can also be used to deposit TiN/TiO2 nanocomposite films, which are used as barrier layers in dentistry. Plasma-enhanced atomic layer deposition of TDMAT with NH₃ can yield TiN nanofilms, suppressing secondary electron emission on surfaces and improving the performance of spacecraft and its components in the field of vacuum electronic devices.

These amino metal compounds have a wide range of applications, from specialized optics and ceramics to catalysis and enzyme reactions. They contribute to advancements in various industries, including aerospace and pharmaceuticals.